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Typical Characterizations Provided By MaxMile EpiEL Mapping Systems
MaxMile Technologies' EL
mapping systems have the capabilities to rapidly determine the
device-level emissive and electrical properties of light-emitting
materials without device fabrication. They can be used either as a
wafer-scale EL mapper or as a quick EL tool for random and
individual point test.
Quick EL test
In quick EL test mode,
full-scale emissive and electrical properties of light-emitting
materials can be nondestructively characterized at any point in the
wafer, which include: (a) electroluminescence spectra at specific
driving current, (b) current-voltage and emission-voltage
characteristics (LIV) (c) output intensity characteristics, and (d) peak/dominant wavelength (WLP/WLD) & FWHM vs. driving current.
Wafer-scale EL mapping
MaxMiles proprietary EpiEL
probe technology ensures that the above device-level emissive and
electrical characterization can be reliably performed over an entire
wafer. This capability makes wafer-scale, rapid and nondestructive
EL mapping possible. After properly selecting the mapping area and
number of sampling points, various emissive and electrical mapping
will be obtained in a few minutes, which includes slope quantum
efficiency, FWHM, peak/dominant wavelength (WLP/WLD), total emissive intensity, driving
current/voltage at given voltage/current, emissive intensity at
given driving current or wavelength, turn-on voltage, etc. Each sampling point
consists of multiple EL spectra, current-voltage and
emission-voltage characteristics, output intensity characteristics,
and peak/dominant wavelength (WLP/WLD) & FWHM vs. driving current.
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